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Dress Pattern Designing: The basic principles of cut and fit

By: Material type: TextTextPublication details: Oxford : Blackwell Publishing, 2010Edition: 7ª ediciónDescription: 175 pags.; il. colISBN:
  • 9780632065011
Subject(s):
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Holdings
Item type Current library Collection Call number Vol info Status Date due Barcode
Llibre_M IED Barcelona Sala Moda - Fashion M1.P/0001 (Browse shelf(Opens below)) Núm. Missing 3333000
Browsing IED Barcelona shelves, Shelving location: Sala, Collection: Moda - Fashion Close shelf browser (Hides shelf browser)
M1.MA/0014 Diseño e investigación M(VER) Ver Do not disturb / M(KAR) Sis Donna Karan New York / M1.P/0001 Dress Pattern Designing: M1.021.3(520) Dye Dyeing originated in Okinawa : M2.055.02 Bro Eco fashion / M(Ber) Mus Elio Berhanyer :

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